© 2013 г. Qing Tao; Fengguang Luo; Jinxing Zhang; Bingcheng Mo; Rui Zhong; Dandan Miao; Xiaoxing Pan; Qianliang Liang
Wuhan National Laboratory for Optoelectronics, School of Optoelectronic Science and Engineering, Huazhong University of Science and Technology, Wuhan, China
E-mail: fgluo@mail.hust.edu.cn, taoqing107@yahoo.com.cn
In this paper, we have analyzed the relationship between light propagation performance and uneven thickness of Su8-photo-resist based on EOPCB. Although spinning process is used to even the Su8-photo-resist, the obtained Su8-photo-resist is uneven, which directly affect cross-section shape of core layer. As long as we control h e [0,3 mm] and a, b e [0,2 mm], light propagation performance does not affected. But, it is easy to actually fabricate EOPCB.
Key words: Spinning process, EOPCB, Polymer optical waveguide
Codes OCIS: 250.3680, 5460.
UDK 621.397
Submitted 01.11.2012.
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