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ISSN: 1023-5086

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ISSN: 1023-5086

Научно-технический

Оптический журнал

Полнотекстовый перевод журнала на английский язык издаётся Optica Publishing Group под названием “Journal of Optical Technology“

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Smoothing evolution model for computer controlled optical surfacing

Shu Y., Nie X., Shi F., Li S.

Полный текст на elibrary.ru

Публикация в Journal of Optical Technology

Ссылка для цитирования:

Y. Shu, X. Nie, F. Shi, S. Li Smoothing evolution model for computer controlled optical surfacing [на англ. яз.] // Оптический журнал. 2014. Т. 81. № 3. С. 67–71.

 

Y. Shu, X. Nie, F. Shi, S. Li Smoothing evolution model for computer controlled optical surfacing [in English] // Opticheskii Zhurnal. 2014. V. 81. № 3. P. 67–71.

Ссылка на англоязычную версию:

Y. Shu, X. Nie, F. Shi, and S. Li, "Smoothing evolution model for computer controlled optical surfacing," Journal of Optical Technology. 81(3), 164-167 (2014). https://doi.org/10.1364/JOT.81.000164

Аннотация:

A polishing pad can smooth out mid-to-high spatial frequency errors automatically due to its rigidity and modeling of the smoothing effect is important. The relationship between surface error and polishing time is built here based on the Bridging model and Preston’s equation. A series of smoothing experiments using pitch tools under different motion manners were performed and the results verified exponential decay between surface error and smoothing time. At the same time, parameters describing smoothing efficiency and smoothing limit were also fitted from the results. This method can be applied to predict the smoothing effect, estimate the smoothing time and compare smoothing rates of different runs.

Ключевые слова:

Computer Controlled Optical Surfacing, mid-to-high spatial frequency errors, smoothing efficiency, smoothing evolution model

Благодарность:

Работа выполнена при частичной финансовой поддержке Национального фонда естественных наук Китая (гранты №№ 91023042, 60908022) и плана "973" министерства науки и технологий (грант № 2011CB013200).

Коды OCIS: 220.4610, 220.5450

Список источников:

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