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Determination of optical properties in nanostructured TiO2 thin film fabricated by electron beam physical vapor deposition
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Publication in Journal of Optical Technology
Akbar Eshaghi, Abbas Ail Aghaei Determination of optical properties in nanostructured TiO2 thin film fabricated by electron beam physical vapor deposition [на англ. яз.] // Оптический журнал. 2016. Т. 83. № 1. С. 36–39.
Akbar Eshaghi, Abbas Ail Aghaei Determination of optical properties in nanostructured TiO2 thin film fabricated by electron beam physical vapor deposition [in English] // Opticheskii Zhurnal. 2016. V. 83. № 1. P. 36–39.
Akbar Eshaghi and Abbas Ail Aghaei, "Determination of optical properties in nanostructured TiO2 thin film fabricated by electron beam physical vapor deposition," Journal of Optical Technology. 83(1), 26-29 (2016). https://doi.org/10.1364/JOT.83.000026
In this research, nanostructured TiO2 thin film was deposited on a glass substrate by the electron beam physical vapor deposition method. X-ray diffraction, field emission scanning electron microscopy, and a UV-VIS-NIR spectrophotometer were used to characterize the structure, morphology, and transmittance spectrum of the TiO2 thin film. X-ray diffraction showed that the TiO2 thin film included both anatase and rutile phases and the field emission scanning electron microscopy indicated the average crystal size was 35 nm. Optical parameters of the TiO2 thin film such as refractive index, extinction coefficient, thickness, and band gap were measured by the Swanepoel method based on the transmittance spectrum.
nanostructure, TiO2, thin film, optical properties
OCIS codes: 160.4670, 160.4760, 240.0310
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