УДК: 538.958, 538.971, 539.21

Infrared spectroscopic study to determine thermal resistance of the functionalized surface of a detonation nanodiamond

Romanov, N.M., Osipov, V.Y., Takai, K., Touhara, H., Hattori, Y.

Publication in Journal of Optical Technology

For Russian citation (Opticheskii Zhurnal):

Романов Н.М., Осипов В.Ю., Takai K., Touhara H., Hattori Y. Исследование терморезистентности функционализированной поверхности детонационного наноалмаза методом инфракрасной спектроскопии // Оптический журнал. 2017. Т. 84. № 10. С. 7–11.

Romanov N.M., Osipov V.Yu., Takai K., Touhara H., Hattori Y. Infrared spectroscopic study to determine thermal resistance of the functionalized surface of a detonation nanodiamond [in Russian] // Opticheskii Zhurnal. 2017. V. 84. № 10. P. 7–11.

For citation (Journal of Optical Technology):

N. M. Romanov, V. Yu. Osipov, K. Takai, H. Touhara, and Y. Hattori, "Infrared spectroscopic study to determine thermal resistance of the functionalized surface of a detonation nanodiamond," Journal of Optical Technology. 84(10), 654-657 (2017). https://doi.org/10.1364/JOT.84.000654

Abstract:

Infrared spectroscopy was used to analyze detonation nanodiamond powder with surfaces functionalized by fluorine- or oxygen-bearing groups before and after heat treatment in air. Fluorination at T=500°C has a significant effect on the actual condition of the diamond surface. The infrared absorption bands associated with the fluorocarbon groups occur at 1092, 1156, 1248, and 1340 cm⁻¹. We show that heat treatment does not have any qualitative effect on the broad infrared absorption band between 1000 and 1400 cm⁻¹ characterizing the fluorinated surface when the sample is heat treated at temperatures up to 520°C. This can be attributed to the entire surface of the detonation nanodiamond particles being covered by saturated, strong, covalent C–F bonds arising from the use of an element more electronegative than oxygen.

Keywords:

infrared spectroscopy, nanodiamond, fluorination, chemical oxidation, gas-phase etching, thermal resistance

Acknowledgements:

The authors thank A. Ya. Vul’ (Ioffe Engineering Physics Institute) and I. B. Zakharov (Saint-Petersburg State Polytechnical Institute) for their consultations regarding this paper.

Prof. Takai Kazuyuki thanks Japan Society for the Promotion of Science (JSPS) (16K05758, 26107532) for support.

The authors also thank Russian Fund for Basic Research (17-52-50004YaF_a) and international research programm JSPS-RFBR for support.

OCIS codes: 300.6340, 160.4236, 350.4990, 300.6520

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