Features of the plasma-chemical etching of quartz glass during the formation of deep surface relief on high-precision components of devices

Odinokov, S.B., Sagatelyan, G.R., Kovalev, M.S., Bugorkov, K.N.

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For Russian citation (Opticheskii Zhurnal):

Одиноков С.Б., Сагателян Г.Р., Ковалев М.С., Бугорков К.Н. Особенности плазмохимического травления кварцевого стекла при формировании глубокого рельефа на прецизионных деталях приборов // Оптический журнал. 2019. Т. 86. № 5. С. 70–77. http://doi.org/10.17586/1023-5086-2019-86-05-70-77

Odinokov S.B., Sagatelyan G.R., Kovalev M.S., Bugorkov K.N. Features of the plasma-chemical etching of quartz glass during the formation of deep surface relief on high-precision components of devices [in Russian] // Opticheskii Zhurnal. 2019. V. 86. № 5. P. 70–77. http://doi.org/10.17586/1023-5086-2019-86-05-70-77

For citation (Journal of Optical Technology):

S. B. Odinokov, G. R. Sagatelyan, M. S. Kovalev, and K. N. Bugorkov, "Features of the plasma-chemical etching of quartz glass during the formation of deep surface relief on high-precision components of devices," Journal of Optical Technology. 86(5), 317-322 (2019). https://doi.org/10.1364/JOT.86.000317

Abstract:

This paper discusses features of the phenomena that occur during plasma-chemical etching of optical glass when deep relief is being fabricated on high-precision components of devices, using apparatus with inductively coupled plasma.

Keywords:

quartz glass, pendulum accelerometer, surface relief, plasma-chemical etching, reaction-diffusion mechanism, dissipative structures

Acknowledgements:

This work was carried out at the N.É. Bauman Moscow State Technical University with support from a grant of the Russian Science Foundation (Project No.18-79-00304).

OCIS codes: 160.2750, 220.4000, 240.6700

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