ru
Back
DOI: 10.17586/1023-5086-2022-89-06-73-80
УДК: 535.41
Formation of periodic relief structures in thin chromium films using laser interference lithography
Full text «Opticheskii Zhurnal»
Full text on elibrary.ru
Publication in Journal of Optical Technology
Полетаев С.Д., Любимов А.И. Формирование рельефных периодических структур в тонких плёнках хрома с применением лазерно-интерференционной литографии // Оптический журнал. 2022. Т. 89. № 6. С. 73–80. http://doi.org/10.17586/1023-5086-2022-89-06-73-80
Poletaev S.D., Lyubimov A.I. Formation of periodic relief structures in thin chromium films using laser interference lithography [in Russian] // Opticheskii Zhurnal. 2022. V. 89. № 6. P. 73–80. http://doi.org/ 10.17586/1023-5086-2022-89-06-73-80
S. D. Poletaev and A. I. Lyubimov, "Formation of periodic relief structures in thin chromium films using laser interference lithography," Journal of Optical Technology. 89(6), 359-364 (2022). https://doi.org/10.1364/JOT.89.000359
Subject of study. The formation process of contact masks in thin films of photoresist and chromium using laser interference lithography was investigated. Hence, the photoresist films were structured by exposure in the interference field followed by the transfer of the formed microrelief to the chromium film using a plasma method. Method. The investigation is based on the use of laser interference lithography for the formation of protective masks in the layer of high-resolution photoresist. The photoresist was deposited via spin coating and subsequently dried. Lloyd’s interference scheme was used for photoresist exposure. After exposure, the photoresist was developed in a standard base developer specified by the manufacturer. The distribution nonuniformity of thickness of the photoresist film with microrelief over the substrate surface after development was determined as a ratio of difference in photoresist thicknesses at the substrate edges obtained using profilometry to the maximum thickness. Microrelief in the photoresist layer and chromium film was investigated via scanning probe microscopy. The etching uniformity and process of the microrelief transfer to the chromium film via the protective mask in the photoresist layer were investigated using a setup for reactive ion etching in inductively coupled plasma. Main results. The periodic relief structures in chromium films were obtained for the first time via laser interference lithography for photoresist structuring and transfer of microrelief by reactive ion etching. The obtained depth of microrelief in the photoresist layer corresponded to 350 nm. This depth is sufficient for microrelief transfer to the metal film. We established that the interference field in the recording area enables the formation of the microrelief in the photoresist layer with a coefficient of film thickness nonuniformity of 5% over the surface of the substrate with a diameter of 25 mm. Practical significance. The conducted investigation is initial and the aim involved identifying the principal possibility of formation of contact masks in metal films using laser interference lithography. If the lithographic setup is modified, this method can be applied to form contact masks for diffractive optical elements on substrates with sizes exceeding 25×25mm.
microstructures, laser-interference lithography, spatial frequency, reactive-ion etching
Acknowledgements:The research was carried out within the state assignment "Crystallography and photonucs" of RAS (agreement No. 007-ГЗ/43363/26).
OCIS codes: 220.3740, 220.4000, 090.1970, 310.1860
References:1. Y. Chen, “Nanofabrication by electron beam lithography and its applications: a review,” Microelectron. Eng. 135(5), 57–72 (2015).
2. H. D. Wanzenboeck and S. Waid, “Focused ion beam lithography,” in Recent Advances in Nanofabrication Techniques and Applications, B. Cui, ed. (InTech, Zagreb, 2011), pp. 27–50.
3. V. P. Veiko, V. I. Korol’kov, A. G. Poleshchuk, A. R. Sametov, E. A. Shakhno, and M. V. Yarchuk, “Study of the spatial resolution of laser thermochemical technology for recording diffraction microstructures,” Quantum Electron. 41(7), 631–636 (2011).
4. E. Stankevicius, M. Gedvilas, B. Voisiat, and M. Malinauskas, “Fabrication of periodic micro-structures by holographic lithography,” Lith. J. Phys. 53(4), 227–237 (2013).
5. M. Vala and J. Homola, “Multiple beam interference lithography: a tool for rapid fabrication of plasmonic arrays of arbitrary shaped nanomotifs,” Opt. Express 24(14), 15656–15665 (2016).
6. A. F. Lasagni, D. Yuan, P. Shao, and S. Das, “Periodic micropatterning of polyethylene glycol diacrylate hydrogel by laser interference lithography using nano- and femtosecond pulsed lasers,” Adv. Eng. Mater. 11(3), B20–B24 (2009).
7. T. Kondo, S. Matsuo, S. Juodkazis, V. Mizeikis, and H. Misawa, “Multiphoton fabrication of periodic structures by multibeam interference of femtosecond pulses,” Appl. Phys. Lett. 82(17), 2758–2760 (2003).
8. Z. Wang, G. Zhao, W. Zhang, F. L. Lin, and Z. Zheng, “Low-cost micro-lens arrays fabricated by photosensitive sol–gel and multibeam laser interference,” Photon. Nanostruct.—Fundam. Appl. 10(4), 667–673 (2012).
9. X. Chen, S. H. Zaidi, S. R. J. Brueck, and D. Devine, “Interferometric lithography of sub-micrometer sparse hole arrays for field-emission display applications,” J. Vac. Sci. Technol., A 14(5), 3339–3349 (1996).
10. C. S. Lim, M. H. Hong, Y. Lin, Q. Xie, B. Luk’yanchuk, and A. Rahman, “Microlens array fabrication by laser interference lithography for super-resolution surface nanopatterning,” Appl. Phys. Lett. 89(19), 191125 (2006).
11. C. Lu and R. H. Lipson, “Interference lithography: a powerful tool for fabricating periodic structures,” Laser Photon. Rev. 4(4), 568–580 (2010).
12. X. Zhang, X. Ma, F. Dou, and P. Zhao, “A biosensor based on metallic photonic crystals for the detection of specific bioreactions,” Adv. Funct. Mater. 21(22), 4219–4227 (2011).
13. M. Miyake, Y. Chen, P. V. Braun, and P. Wiltzius, “Fabrication of three-dimensional photonic crystals using multibeam interference lithography and electrodeposition,” Adv. Mater. 21, 3012–3015 (2009).
14. I. B. Divliansky, T. S. Mayer, K. S. Holliday, and V. Crespi, “Fabrication of three-dimensional polymer photonic crystal structures using single diffraction element interference lithography,” Appl. Phys. Lett. 82(11), 1667–1669 (2003).
15. S. B. Odinokov, M. V. Shishova, A. Y. Zherdev, D. S. Lushnikov, and V. V. Markin, “Investigation of the recording mechanism of multiplex Bragg gratings for planar optical radiation input/output in glass light-guides,” Opt. Spectrosc. 129(5), 538–546 (2021) [Opt. Spektrosk. 129(4), 427–435 (2021)].
16. V. A. Soifer, Methods of Computer Optics (Fizmatlit, Moscow, 2003).
17. E. A. Bezus, L. L. Doskolovich, and N. L. Kazanskii, “Interference pattern generation in evanescent electromagnetic waves for nanoscale lithography using waveguide diffraction gratings,” Quantum Electron. 41(8), 759–764 (2011).
18. S. N. Koreshev and V. P. Ratushny˘ı, “The limiting possibilities of interference photolithography implemented in the visible region on thin films of glassy chalcogenide semiconductor,” J. Opt. Technol. 79(5), 289–294 (2012) [Opt. Zh. 79(5), 40–47 (2012)].
19. A. Malag, “Simple interference method of diffraction grating generation for integrated optics by the use of a Fresnel mirror,” Opt. Commun. 32(1), 54–58 (1980).
20. http://www.cnilaser.com/PDF/MDL-C-405.pdf.
21. E. Berlin, S. Dvinin, and L. Seidman, Vacuum Technology and Equipment for Deposition and Etching of Thin Films (Tekhnosfera, Moscow, 2007).
22. R. Xu, Z. Deng, Y. Yue, S. Wang, X. Li, Z. Ma, Y. Jiang, L. Wang, C. Du, H. Jia, W. Wang, and H. Chen, “Fabrication of large-scale uniform submicron inverted pyramid pit arrays on silicon substrates by laser interference lithography,” Vacuum 165, 1–6 (2019).
23. D. Wang, Z. Wang, Z. Zhang, Y. Yue, D. Li, and C. Maple, “Effects of polarization on four-beam laser interference lithography,” Appl. Phys. Lett. 102(8), 081903 (2013).
24. M. Gedvilas, S. Indrisiunas, B. Voisiat, and E. Stankevicius, “Nanoscale thermal diffusion during the laser interference ablation using femto-, pico-, and nanosecond pulses in silicon,” Phys. Chem. Chem. Phys. 20(17), 12166–12174 (2018).
25. J. Park, D. H. Yun, Y. W. Ma, and C. Y. Gwak, “Prism-based laser interference lithography system for simple multibeam interference lithography,” Sci. Adv. Mater. 12(3), 398–402 (2020).
26. J. Wu, Z. Geng, Y. Xie, Z. Fan, Y. Su, C. Xu, and H. Chen, “The fabrication of nanostructures on polydimethylsiloxane by laser interference lithography,” Nanomaterials 9(1), 73 (2019).
27. D. V. Nesterenko, S. D. Poletaev, O. Y. Moiseev, D. M. Yakunenkova, A. V. Volkov, and R. V. Skidanov, “Fabrication of the curved diffraction gratings for UV,” Izv. Samar. Nauchn. Tsentra Ross. Akad. Nauk 13(4), 66–71 (2011).