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DOI: 10.17586/1023-5086-2023-90-03-05-15
УДК: 666.11+546.22+535.8
Resolution ability of inorganic chalcogenide resist for hologram recording
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Publication in Journal of Optical Technology
Михайлов М.Д., Белых А.В., Юсупов И.Ю. Разрешающая способность неорганического халькогенидного резиста при записи голограмм // Оптический журнал. 2023. Т. 90. № 3. С. 5–15. http:doi.org/10.17586/1023-5086-2023-90-03-05-15
Mikhailov M.D., Belykh A.V., Yusupov I.Yu. Resolution ability of inorganic chalcogenide resist for hologram recording [in Russian] // Opticheskii Zhurnal. 2023. V. 90. № 3. P. 5–15. http:doi.org/10.17586/1023-5086-2023-90-03-05-15
M. D. Mikhailov, A. V. Belykh, and I. Yu. Yusupov, "Resolution ability of inorganic chalcogenide resists for hologram recording," Journal of Optical Technology. 90(3), 107-113 (2023). https://doi.org/10.1364/JOT.90.000107
Subject of research. Peculiarity of inorganic photoresists properties based on the chalcogenide glasses thin films. Objective. The thin films etching processes study and comparison between calculation results and experimental data for the relief shape of relief phase hologram gratings and secure holograms. Method. The As-S-Se system thin films were obtained by relief phase thermal evaporation in vacuum. Films exposure has been done by light with wavelength 380, 436, and 488 nm. Films dissolution rate in amine solutions was measured by interferometric method at wavelength 650 nm. Main results. The developed compositions of chalcogenide photoresists and their application technology are used for relief phase holograms recording – diffraction gratings and optical guard elements. When recording high-frequency structures with a groove frequency above 2000 mm–1, a seeming decrease in resolution is observed when exposed to low-intensity radiation. It is found that mismatching between expected relief shape and experimentally obtained one can be explained by diffusion of excited electron states from irradiated areas into dark ones during exposure. This effect lets us recording holograms unto multilayer structures consisting of chalcogenide layers with different compositions and also different photosensitivity. As an example, with the use of chalcogenide photoresist properties peculiarity it is possible to obtain multilayer relief structures, to enable color images in zero order of diffraction. Practical value. The use of chalcogenide glasses photosensitive films for recording the diffraction gratings allows to manufacture optical elements of large size. Electron-hole pairs diffusion effect allows to record replicable relief phase elements with color images in zero order of diffraction.
Acknowledgment: the authors are grateful to their colleagues who made a significant contribution to the presented work results: R.R. Gerke, A.D. Galpern, T.G. Dubrovina, A.A. Paramonov, S.S. Sementsov.
inorganic photoresist, arsenic sulfide, arsenic selenide, resolution ability, diffraction gratings, relief phase holograms
OCIS codes: 160.2750, 310.6870, 090.2890, 050.1950
References:1. Mikhailov M.D., Dneprovskiy A.S., Mamedov S.B., Yakovuk O.A. Etchant for chalcogenide glasses (its variants) [in Russian] // Author's certificate № 1160483. Bulletin of inventions № 21. 06/07/1985.
2. Dneprovskiy A.S., Mikhailov M.D., Mamedov S.B., Stepanov K.A., Yakovuk O.A. Etching composition for chalcogenide glasses [in Russian] // Author's certificate № 1230145. Unpublished.
3. Gerke R.R., Mamedov S.B., Mikhailov M.D., Yusupov I.Yu., Yakovuk O.A., Gorai L.I. Relief reflective structure [in Russian] // Author's certificate № 1161119. Unpublished.
4. Hallman R.W., Kurtz G.W. Electromagnetic radiation sensitive lithographic plates // Patent US № 3,762,325. 1973.
5. Kolomiets B.T., Lyubin V.M., Shilo V.P. Photoresist [in Russian] // Author's certificate № 489449. Bull. inventions № 47. 12/25/1976.
6. Mikhailov M.D., Kryzhanowsky I.I., Petcheritsyn I.M. Structure and properties of ion-beam sputtered AsxS1–x films // J. Non-Crystall. Sol. 2000. V. 265. № 1–2. P. 1–8. https:doi.org/10.1016/S0022-3093(99)00956-4
7. Moreau W.M. Semiconductor lithography: Principles, practices, materials / 1st ed. Springer, 1988. 952 р.
8. Kolomiets B.T., Lyubin V.M., Shilo V.P. Photostimulated changes in the solubility of chalcogenide glasses [in Russian] // Physics and Chemistry of Glass (Russia). 1978. V. 4. Р. 351–354.
9. Buroff A. Arsenic sulfide as evaporated dry photoresist // Journal de Physique. 1981. V. 142. P. 967–971.
10. Mikhailov M.D., Mamedov S.B., Zventarny S.V. Dissolution kinetics of glassy arsenic sulfide in alkali and amine solutions // J. Non-Crystall. Sol. 1994. V. 176. P. 258–262.
11. Zenkin S.A., Mamedov S.B., Mikhailov M.D. Dissolution kinetics of arsenic sulfide films in solutions of ammonia, methylamine and dimethylamine [in Russian] // J. Applied Chemistry (Russia). 1988. V. 61. Р. 1459–1454.
12. Zenkin S.A., Mamedov S.B., Mikhailov M.D., Turkina E.Yu., Yusupov I.Yu. Mechanism of interaction of amine solutions with monolithic glasses and amorphous films of the As-S system [in Russian] // Glass Physics and Chemistry (Russia). 1997. V. 23. P. 393–397/
13. Nesterov S.I., Boyko M.E., Krbal M., Kolobov A.V. On the ultimate resolution of As2S3-based inorganic resists // J/ Non-Crystall. Sol. 2021. V. 563. P. 120816. https:doi.org/10.1016/j.jnoncrysol.2021.120816
14. Gerke R., Mikhailov M., Yusupov I. Photosensitivity of As-S-based chalcogenide photoresists in the recording of relief phase holograms // Proc. SPIE. Holographic Materials V. 1999. V. 3638. P. 119–126. https:doi.org/10.1117/12.342812
15. Lyubin V.M., Sedykh A.M., Smirnova N.N., Shilo V.P. Inorganic photoresists based on chalcogenide glassy semiconductors [in Russian] // Microelectronics (Russia). 1989. V. 18.P. 523–527.
16. Guba B.S., Kryzhanovsky I.I., Mikhailov M.D., Elts V.K. Pulse recording of holograms on photosensitive resistive chalcogenide layers // J. Opt. Technol. 1997. V. 64. P. 822–824
17. Nesterov S.I., Myagkov D.V., Portnoi E.L. Nanoscale periodical structures fabricated by interference photolithography // Internat. J. Nanoscience. 2004. V. 3. P. 59–64. https:doi.org/10.1142/S0219581X0400181X
18. Waitts R.R., Cueli M.S. Multi-colored material using rainbow grating // Patent US № 5,158,84. 1992.