Matrix measurement technology. The accuracy of measuring the coordinates of the elements and the control of the photomasks

Korolev A.N., Lukin, A.Y., Filatov, Y.V., Venediktov, V.Y.

Publication in Journal of Optical Technology

For Russian citation (Opticheskii Zhurnal):

Королев А.Н., Лукин А.Я., Филатов Ю.В., Венедиктов В.Ю. Матричная технология измерений. Точность измерения координат элементов и контроль фотошаблонов // Оптический журнал. 2024. Т. 91. № 3. С. 115–123. http://doi.org/10.17586/1023-5086-2024-91-03-115-123

Korolev A.N., Lukin A.Ya., Filatov Yu.V., Venediktov V.Yu. Matrix measurement technology. The accuracy of measuring the coordinates of the elements and the control of the photomasks [in Russian] // Optickhesii Zhurnal. 2024. V. 91. № 3. P. 115–123. http://doi.org/10.17586/1023-5086-2024-91-03-115-123

For citation (Journal of Optical Technology):

Alexander N. Korolev, Alexander Ya. Lukin, Yuri V. Filatov, and Vladimir Yu. Venediktov, "Matrix measurement technology: accuracy of measuring element coordinates and photomask control," Journal of Optical Technology. 91(3), 203-208 (2024). https://doi.org/10.1364/JOT.91.000203

Abstract:

Subject of study. A new technology for linear-angular measurements, based on the use of a multielement mark and obtaining measurement information about the angular and linear shift from a set of measurements for all elements of the mark image; accuracy of measuring the coordinates of brand image elements in a matrix meter. Aim of the study. Obtaining estimates of errors in measuring the coordinates of mark image elements during experimental studies. Method. The error of measuring the coordinates of the elements of the synthesized image of the stamp based on the measurement results is investigated. Main results. Real measurements of the coordinates of the elements were performed in the presence of distortions due to lens distortion and manufacturing errors of the mark. The possibility of separating these distortions, measuring their parameters and correcting them to the error values obtained on a digital model is shown. Practical significance. It is shown that the procedure for determining and correcting image distortions can be used as the basis for a measuring complex for controlling the technology of manufacturing photomasks at all stages. The conducted research shows that this problem can be solved at an error level of 0.2 μm for a large number of zones with a density of up to 40 000 elements per 1 cm².

Keywords:

matrix measurement technology, matrix meter, measuring mark, correction of mark image distortions

Acknowledgements:

this work was carried out with financial support from the Russian Science Foundation, grant № 20-19-00412

OCIS codes: 120.0120, 230.0230

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