УДК: 541.1
Obtainin high-purity chemical materials for chemical, plasmachemical and purolytic deposition of thin oxide films
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Publication in Journal of Optical Technology
Потелов В.В. Получение особо чистых химических материалов для процессов химического, плазмохимического и пиролитического осаждения тонких оксидных слоев // Оптический журнал. 2009. Т. 76. № 8. С. 36–40.
Potelov V.V. Obtainin high-purity chemical materials for chemical, plasmachemical and purolytic deposition of thin oxide films [in Russian] // Opticheskii Zhurnal. 2009. V. 76. № 8. P. 36–40.
V.V. Potelov, "Obtainin high-purity chemical materials for chemical, plasmachemical and purolytic deposition of thin oxide films," Journal of Optical Technology. 76 (8), 478-481 (2009). https://doi.org/10.1364/JOT.76.000478
This paper discusses questions of the purification of silicone compounds and alcoholates by rectification, crystallization, and adsorption for obtaining thin oxide layers as well as multilayer structures for various functional purposes.
silicone compounds, high-purity materials, rectification, crystallization, adsorption
OCIS codes: 220.4610, 160.4670, 160.4760
References:
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