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УДК: 621.793.18:538.958
Ellipsometry of TiOx coatings deposited in a magnetron apparatus with an unbalanced magnetic system: effect of the oxygen concentration and the magnetron–substrate distance
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Publication in Journal of Optical Technology
Нарцев В.М., Аткарская А.Б., Зайцев С.В., Осипенко Н.В., Прохоренков Д.С., Евтушенко Е.И. Эллипсометрия TiOx-покрытий, осажденных в магнетронной установке с несбалансированной магнитной системой. Влияние концентрации кислорода и дистанции "магнетрон-подложка" // Оптический журнал. 2016. Т. 83. № 4. С. 88–94.
Nartsev V.M., Atkarskaya A.B., Zaitsev S.V., Osipenko N.V., Prokhorenkov D.S., Evtushenko E.I. Ellipsometry of TiOx coatings deposited in a magnetron apparatus with an unbalanced magnetic system: effect of the oxygen concentration and the magnetron–substrate distance [in Russian] // Opticheskii Zhurnal. 2016. V. 83. № 4. P. 88–94.
V. M. Nartsev, A. B. Atkarskaya, S. V. Zaĭtsev, N. V. Osipenko, D. S. Prokhorenkov, and E. I. Evtushenko, "Ellipsometry of TiOx coatings deposited in a magnetron apparatus with an unbalanced magnetic system: effect of the oxygen concentration and the magnetron–substrate distance," Journal of Optical Technology. 83(4), 263-267 (2016). https://doi.org/10.1364/JOT.83.000263
The method of spectral modulation ellipsometry is used to investigate the structure and optical properties of thin TiOx coatings deposited by magnetron with various oxygen concentrations in the plasma, a working pressure of 0.28 Pa, and a discharge current of 5.6 A. It is established that, depending on the fraction of O2, three types of coatings are formed in the plasma: semitransparent three-layer coatings, transparent two-layer coatings, and transparent three-layer coatings. The last coatings have a dense contact layer up to 50 nm thick, whose optical characteristics correspond to crystalline anatase and/or rutile. A correlation is established between the roughness, the band gap, and the impurity concentration in the plasma. It is pointed out that, with 19 vol. % O2, coatings with a low refractive index (2.347), a small band gap (3.31 eV), and high roughness (16.8 nm) are deposited in the plasma, and this must increase the photocatalytic activity of the coatings.
coating, titanium oxides, magnetron deposition, spectral ellipsometry, photocatalytic properties
Acknowledgements:This work was carried out with the financial support of the Ministry of Education and Science of the Russian Federation and the Russian Foundation for Basic Research (Project 12-03-97562-r_tsentr_a).
OCIS codes: 240.0310
References:1. O. Stenzel, Optical Coatings. Material Aspects in Theory and Practice (Springer-Verlag, Berlin, 2014).
2. K. Hashimoto, H. Irie, and A. Fujishima, “TiO2 photocatalysis: a historical overview and future prospects,” Jpn. J. Appl. Phys. 44(12), 8269–8285 (2005).
3. U. Diebold, “The surface science of titanium dioxide,” Surf. Sci. Rep. 48, 53–229 (2003).
4. S. Mahieu, P. Ghekiere, D. Depla, and R. De Gryse, “Biaxial alignment in sputter-deposited thin films,” Thin Solid Films 515(4), 1229–1249 (2006).
5. D. Manova, J. W. Gerlach, and S. Mändl, “Thin-film deposition using energetic ions,” Materials 3(8), 4109–4141 (2010).
6. R. Gouttebaron, D. Cornelissen, R. Snyders, J. P. Dauchot, M. Wautelet, and M. Hecq, “XPS study of TiOx thin films prepared by d.c. magnetron sputtering in Ar-O2 gas mixtures,” Surf. Interface Anal. 30(1), 527–530 (2000).
7. P. Baroch, J. Musil, J. Vlcek, K. H. Nam, and J. G. Han, “Reactive magnetron sputtering of TiOx films,” Surf. Coat. Technol., 193(1–3), 107–111 (2005).
8. A. R. Forouhi and I. Bloomer, “Optical dispersion relations for amorphous semiconductors and amorphous dielectrics,” Phys. Rev. B 34(10), 7018–7026 (1986).
9. M.-I. Kang, S. W. Kim, Y.-G. Kim, and J.-W. Ryu, “Dependence of the optical anisotropy of ZnO2 thin films on the structural properties,” J. Korean Phys. Soc. 57(2), 389–394 (2010).
10. Th. Welzel, “Time-resolved characterisation of pulsed magnetron discharges for the deposition of thin films with plasma diagnostic methods,” in Habilitationsschrift (Chemnitz University of Technology, Chemnitz, 2010).
11. V. M. Nartsev, A. B. Atkarskaya, E. I. Evtushenko, V. S. Vashchilin, D. S. Prokhorenkov, and S. V. Zaı˘tsev, “Study of the fraction of oxygen in the plasma on the phase composition of magnetron-deposited TiOx coatings,” Ogneupory Tekh. Keram. (3), 10–16 (2015).
12. M. N. Solovan, P. D. Maryanchuk, V. V. Brus, and O. A. Parfenyuk, “Electrical and optical properties of TiO2 and TiO 2: Fe thin films,” Inorg. Mater. 48(10), 1026–1032 (2012).
13. V. M. Nartsev, S. V. Zaı˘tsev, D. S. Prokhorenkov, N. V. Osipenko, and E. I. Evtushenko, “Study of the properties of TiOx coatings formed using vacuum-plasma technologies,” Fundam. Issled.: Khim. Nauki (11), 1195–1200 (2012).