Correction of spectral characteristics in the manufacture of bandpass multilayer dielectric filters

Publication in Journal of Optical Technology

For Russian citation (Opticheskii Zhurnal):

Прокашев В.Н. Коррекция спектральной характеристики при изготовлении полосовых многослойных диэлектрических фильтров // Оптический журнал. 2024. Т. 91. № 1. С. 101–107. http://doi.org/10.17586/1023-5086-2024-91-01-101-107

Prokashev V.N. Correction of spectral characteristics in the manufacture of bandpass multilayer dielectric filters [in Russian] // Opticheskii Zhurnal. 2024. V. 91. № 1. P. 101–107. http://doi.org/10.17586/1023-5086-2024-91-01-101-107

For citation (Journal of Optical Technology):

Vadim N. Prokashev, "Correction of spectral characteristics in the manufacture of bandpass multilayer dielectric filters," Journal of Optical Technology. 91(1), 61-64 (2024). https://doi.org/10.1364/JOT.91.000061

Abstract:

Subject of study. Optical multilayer dielectric bandpass filters. Aim of the work. Development of a technique for correcting distortions in the spectral characteristics caused by random deviations in layer thicknesses during filter deposition. Method. For the structures of complex composite bandpass filters, a fairly simple technique for correcting random deviations in the thicknesses of previous layers by deliberately changing the thickness of subsequent layers is considered. Main results. Using the example of the practical implementation of two composite bandpass filters, the application of this technique and the possibility of almost complete correction of distortions of the spectral characteristic are shown. Practical significance. The proposed method of sequential correction of distortions in the spectral characteristics of the multilayer dielectric bandpass filter makes it possible to more effectively achieve the desired result and significantly reduce the amount of defects in the manufacture of such filters, especially large batches of filters.

Keywords:

multilayer interference coatings, vacuum deposition, synthesis of bandpass filters

OCIS codes: 310.4165, 310.1620

References:

1. Macleod H.A. Thin film optical filters / 4th ed. Series in Optics and Optoelectronics. CRC Press, by Taylor and Francis Group, 2010. 772 р.

2. Hawkins G.J., Hunneman R. Design and fabrication of infrared filters for remote sounding instrumentation // Proc. SPIE. 1994. V. 2210. P. 63965. http://dx.doi.org/10.1117/12.188124

3. Furman S.A. and Tikhonravov A.V. Basics of optics of multilayer systems. Gif-sur-Yvette: Editions Frontieres, 1992. 133 р.

4. Thelen A. Design of optical interference coatings. N.Y.: McGraw-Hill Book Company, 1988. 255 р.

5. Voronkova E.M., Grechushnikov B.N., Distler G.I., Petrov I.P. Optical materials for infrared technology [in Russian] / Reference publication. Moscow: ''Nauka'' Publ., 1965. 335 р.

6. Ritter E. Optical film materials and their applications // Appl. Opt. 1976. V. 15. P. 2318–2327. http://dx.doi.org/10.1364/AO.15.002318

7. Zhang K.G., Seeley J.S., Huneman R., and Hawkins G.J. Optical and semiconductor properties of lead telluride coatings // Proc. SPIE. 1989. V. 1112. P. 393–402. http://dx.doi.org/10.1117/12.960798

8. Kim Jong Sup, Putilin E.S. Formation of layer thickness by vacuum evaporation // J. Opt. Technol. 1998. V. 65. № 10. P. 843.

9. Tikhonravov A.V., Trubetskov M.K., and Amotchkina T.V. Statistical approach to choosing a strategy of monochromatic monitoring of optical coating production // Appl. Opt. 2006. V. 45. P. 7863–7870. http://dx.doi.org/10.1364/AO.45.007863

10. Tikhonravov A.V., Trubetskov M.K., and Amotchkina T.V. Investigation of the effect of accumulation of thickness errors in optical coating production by broadband optical monitoring // Appl. Opt. 2006. V. 45. P. 7026–7034. http://dx.doi.org/10.1364/AO.45.007026

11. Macleod H.A. and Richmond D. The effect of errors in the optical monitoring of narrow-band all-dielectric thin film optical filters // Optica Acta. 1974. V. 21. P. 429–443.

12. Hiraga R., Sugawara N., Ogura S., and Amano S. Measurement of spectral characteristics of optical thin film by rapid scanning spectrophotometer // Japanese J. Appl. Phys. 1974. P. 689–692.

13. Kotlikov E.N., Tropin A.N. Stability criterion of the spectral responses of multilayer interference coatings // J. Opt. Technol. 2009. V. 76. № 3. Р. 162–166. http://dx.doi.org/10.1364/JOT.76.000162

14. Kotlikov E.N. Tropin A.N. Correction of spectral characteristics of cutting filters // J. Opt. Technol. 2009. V. 76. № 3. P. 160–161. https://doi.org/10.1364/JOT.76.000160

15. Villa F., Pompa O. Emission pattern of real vapor sources in high vacuum: An overview // Appl. Opt. 1999. V. 38. P. 695–703 http://dx.doi.org/10.1364/AO.38.000695

16. Heitmann W. The influence of various parameters on the refractive index of evaporated dielectric thin films // Appl. Opt. 1968. V. 7. P. 1541–1543. http://dx.doi.org/10.1364/AO.7.001541