УДК: 533.9.07

Dual-pulse bispectral laser excitation and plasma initiation in an extreme-UV radiation source for nanolithography

Seysyan, R.P., Bespalov, V.G., Zhevlakov, A.P., Makarov, E.A., Rodionov, A.Y.

Publication in Journal of Optical Technology

For Russian citation (Opticheskii Zhurnal):

Сейсян Р.П., Беспалов В.Г., Жевлаков А.П., Макаров Е.А., Родионов А.Ю. Двухимпульсное биспектральное лазерное возбуждение и инициация плазмы в источнике экстремально-ультрафиолетового излучения для нанолитографии // Оптический журнал. 2017. Т. 84. № 11. С. 45–54.

Seysyan R.P., Bespalov V.G., Zhevlakov A.P., Makarov E.A., Rodionov A.Yu. Dual-pulse bispectral laser excitation and plasma initiation in an extreme-UV radiation source for nanolithography [in Russian] // Opticheskii Zhurnal. 2017. V. 84. № 11. P. 45–54.

For citation (Journal of Optical Technology):

R. P. Seĭsyan, V. G. Bespalov, A. P. Zhevlakov, E. A. Makarov, and A. Yu. Rodionov, "Dual-pulse bispectral laser excitation and plasma initiation in an extreme-UV radiation source for nanolithography," Journal of Optical Technology. 84(11), 753-760 (2017). https://doi.org/10.1364/JOT.84.000753

Abstract:

This paper describes a laser system that provides dual-pulse bispectral excitation of a laser plasma in an extreme-UV source for nanolithography in this spectral region. The radiation converter is based on a low-power YAG:Nd laser and a powerful CO₂ laser. A saturating signal is injected into the power stage of a CO₂ amplifier by subnanosecond pulses at wavelength 9.2 μm from a stimulated-Raman-scattering amplifier pumped by the radiation of an optical parametric oscillator that uses the radiation of a YAG:Nd solid-state laser (the master oscillator). Mechanisms for high-efficiency conversion of laser radiation into the extreme-UV region (13.4 or 6.7 nm) were theoretically and experimentally studied. The laser system makes it possible to independently establish the optimum delay time between the pulses in order to increase the output of the extreme-UV radiation.

Keywords:

laser plasma, extreme-UV radiation source, YAG:Nd laser, stimulated Raman scattering

Acknowledgements:

The research was partially supported by the International Science and Technology Center (ISTC) (0991, 3857)
The authors express their gratitude to O. B. Danilov for participating in the estimates and providing data concerning the CO 2 slit laser.

OCIS codes: 350.5400, 340.7480, 140.3550

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