Monitoring the displacements of movable lenses in the projection objective of a photolithographic system for producing superlarge integrated microcircuits

Бельский А.Б., Анчуткин В.С., Урвачев С.А. Контроль перемещений подвижных линз в проекционном объективе фотолитографической установки для производства сверхбольших интегральных схем // Оптический журнал. 2007. Т. 74. № 2. С. 49–56.

Belskiy A.B., Anchutkin V.S., Urvachev S.A. Monitoring the displacements of movable lenses in the projection objective of a photolithographic system for producing superlarge integrated microcircuits [in Russian] // Opticheskii Zhurnal. 2007. V. 74. № 2. P. 49–56.

A. B. Bel’skii, V. S. Anchutkin, and S. A. Urvachev, "Monitoring the displacements of movable lenses in the projection objective of a photolithographic system for producing superlarge integrated microcircuits," Journal of Optical Technology. 74 (2), 115-121 (2007). https://doi.org/10.1364/JOT.74.000115

This paper describes structurally integrated capacitive sensors that measure the displacement and tilt angles of the movable mount of the lens module of a system for compensating the image-scale variations caused by thermobaric misalignment of a photolithographic projection objective. We present a technique for choosing the optimum design parameters of capacitive sensors, an algorithm for calculating the displacement and tilt angles from the measured capacitance values of the sensors, and a rough calculation of the error and of the measurement for various displacement ranges.