УДК: 535.317

Study of methods for discretizing a source when modelling a photolithographic image

Publication in Journal of Optical Technology

For Russian citation (Opticheskii Zhurnal):

Иванова Т.В., Зуева Л.В. Исследование способов дискретизации источника при моделировании фотолитографического изображения // Оптический журнал. 2012. Т. 79. № 5. С. 48–52.

Ivanova T. V., Zueva L. V. Study of methods for discretizing a source when modelling a photolithographic image [in Russian] // Opticheskii Zhurnal. 2012. V. 79. № 5. P. 48–52.

For citation (Journal of Optical Technology):

T. V. Ivanova and L. V. Zueva, "Study of methods for discretizing a source when modelling a photolithographic image," Journal of Optical Technology. 79(5), 295-298.

Abstract:

There are two methods for discretizing the source when the formation of a photolithographic image is modelled in terms of the Abbe model: This can be done using a rectangular grid with various discretization steps, or with radial placement of the points on a rectangular grid with various steps along a radius and along the arc length between the points. It is shown that the use of a radial distribution of the points significantly speeds up the computation process, with the modelling accuracy being mainly determined by the step along the radius.

Keywords:

photolithography, Abbe model, source sampling

OCIS codes: 110.1758, 110.2990, 110.1650, 110.3960, 110.5220

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