УДК: 621.397

Analysis of fabrication tolerance based on uneven thickness of Su8-photo-resist

Tao, Qing, Luo, F., Zhang, Jinxing, Mo, Bingcheng, Zhong, Rui, Miao, Dandan, Pan, Xiaoxing, Liang, Qianliang

Publication in Journal of Optical Technology

For Russian citation (Opticheskii Zhurnal):

Qing Tao, Fengguang Luo, Jinxing Zhang, Bingcheng Mo, Rui Zhong, Dandan Miao, Xiaoxing Pan, Qianliang Liang Analysis of fabrication tolerance based on uneven thickness of Su8-photo-resist [на англ. яз.] // Оптический журнал. 2013. Т. 80. № 5. С. 94–97.

Qing Tao, Fengguang Luo, Jinxing Zhang, Bingcheng Mo, Rui Zhong, Dandan Miao, Xiaoxing Pan, Qianliang Liang Analysis of fabrication tolerance based on uneven thickness of Su8-photo-resist [in English] // Opticheskii Zhurnal. 2013. V. 80. № 5. P. 94–97.

For citation (Journal of Optical Technology):

Qing Tao, Fengguang Luo, Jinxing Zhang, Bingcheng Mo, Rui Zhong, Dandan Miao, Xiaoxing Pan, and Qianliang Liang, "Analysis of fabrication tolerance based on uneven thickness of Su8-photo-resist," Journal of Optical Technology. 80(5), 329-331 (2013). https://doi.org/10.1364/JOT.80.000329

Abstract:

In this paper, we have analyzed the relationship between light propagation performance and uneven thickness of Su8-photo-resist based on EOPCB. Although spinning process is used to even the Su8-photo-resist, the obtained Su8-photo-resist is uneven, which directly affect cross-section shape of core layer. As long as we control h ∈ 0; 3 μm and a, b ∈ 0; 2 μm, light propagation performance does not affected. But, it is easy to actually fabricate EOPCB.

Keywords:

spinning process, EOPCB, polymer optical waveguide

Acknowledgements:

This research is supported by the major project of Chinese national programs for fundamental research and development (973 Program) (Grant no. 2010CB328302).

OCIS codes: 250.3680, 5460

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