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ISSN: 1023-5086


ISSN: 1023-5086

Scientific and technical

Opticheskii Zhurnal

A full-text English translation of the journal is published by Optica Publishing Group under the title “Journal of Optical Technology”

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УДК: 621.373.535

Influence of multi-pulse action on the evolution of silicon microrelief under femtosecond laser irradiation

For Russian citation (Opticheskii Zhurnal):

Гук И.В., Кузьмин Е.В., Шандыбина Г.Д., Яковлев Е.Б., Дюкин Р.В., Кулагин В.С. Влияние многоимпульсного воздействия на эволюцию микрорельефа кремния при лазерном фемтосекундном облучении // Оптический журнал. 2017. Т. 84. № 7. С. 41–46.


Guk I.V., Kuzmin E.V., Shandybina G.D., Yakovlev E.B., Dyukin R.V., Kulagin V.S. Influence of multi-pulse action on the evolution of silicon microrelief under femtosecond laser irradiation [in Russian] // Opticheskii Zhurnal. 2017. V. 84. № 7. P. 41–46.

For citation (Journal of Optical Technology):

I. V. Guk, E. V. Kuz’min, G. D. Shandybina, E. B. Yakovlev, R. V. Dyukin, and V. S. Kulagin, "Influence of multi-pulse action on the evolution of silicon microrelief under femtosecond laser irradiation," Journal of Optical Technology. 84(7), 462-466 (2017).


The results of numerical modeling of the process of multi-pulse femtosecond laser photoexcitation and heating of monocrystalline silicon are presented. It is shown that starting from a certain level of irradiance at pulse repetition rates of 10–1000 Hz, the structural changes in the surface that occur between pulses influence the spatiotemporal distribution of the electron plasma in the near-surface layer of the semiconductor at the time of irradiation with a subsequent pulse and thus accumulate, forming a stable surface microstructure in the irradiated region. A mechanism is proposed for the formation of a two-dimensional periodic microrelief on a silicon surface, which is based on a change in the type of a surface excited by electromagnetic waves with an increasing number of irradiating femtosecond pulses.


femtosecond laser pulses, monocrystalline silicon, surface laser microstructuring, surface plasmon resonance, optical multilayer structures

OCIS codes: 280.6680, 320.7120


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