УДК: 621.3.04977.002.5

Optical instrumentation for microelectronics

Gurevich, E.S., Tochitskiy, Y.I., Tsuran, V.I.

Publication in Journal of Optical Technology

For Russian citation (Opticheskii Zhurnal):

Гуревич Э.С., Точицкий Я.И., Цуран В.И. Оптическое приборостроение для микроэлектроники // Оптический журнал. 2013. Т. 80. № 5. С. 38–43.

Gurevich E.S., Tochitskiy Ya.I., Tsuran V.I. Optical instrumentation for microelectronics [in Russian] // Opticheskii Zhurnal. 2013. V. 80. № 5. P. 38–43.

For citation (Journal of Optical Technology):

É. S. Gurevich, Ya. I. Tochitskiĭ, and V. I. Tsuran, "Optical instrumentation for microelectronics," Journal of Optical Technology. 80(5), 289-293 (2013). https://doi.org/10.1364/JOT.80.000289

Abstract:

This article is devoted to the work of the Design Office of Precision Electronic Machine-Construction (KBTÉM OMO), which for more than fifty years has provided microelectronics for optomechanical equipment. The size of the elements of integrated circuits has been reduced by a factor of 30 (from 5 μm to 180 nm) by using this equipment, and the accuracy with which they are arranged on the entire area of a wafer has been increased by a factor of 200 (from 2 μm to 10 nm). The first integrated circuits, with tens of transistors, have metamorphosed into complex functional systems, with billions of transistors.

Keywords:

optomechanical equipment for photolithography, microlithography

References:

1. B. J. Lin, Optical Lithography: Here is Why (SPIE, Bellingham, Washington, 2009).
2. K. A. Valiev, Physical Bases of Submicron Lithography in Microelectronics (Radio i Svyaz’, Moscow, 1984).
3. Ya. I. Tochitskiı˘, Optical Technologies of Micro- and Nanoelectronics (RIVSh, Minsk, 2010).
4. I. M. Glazkov and Ya. A. Raı˘khman, Image Generators in the Production of Integrated Microsystems (Nauka i Tekhnika, Minsk, 1981).
5. É. S. Gurevich, L. P. Psikova, and G. V. Fokova, “Projection objective with magnification—0.1,” Inventor’s Certificate No. 1 177 788.
6. É. S. Gurevich, V. I. Tsuran, G. I. Tikhonchuk, and A. L. Bogush, “Projection objective with magnification—1/5×,” Patent of the Republic of Belarus No. 5713 (2003).
7. G. V. Fokova and É. S. Gurevich, “Illuminator for projection optical printing,” Patent of the Republic of Belarus No. 7688 (2006).
8. É. S. Gurevich, G. I. Tikhonchuk, V. E. Matyushkov, A. L. Bogush, A. S. Ageı˘chenko, and V. I. Tsuran, “Exposure projection system with magnification 1×,” Korean Patent No. 0586062 (2006).