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DOI: 10.17586/1023-5086-2021-88-10-78-82
УДК: 621.373.8
Laser plasma–chemical treatment of optoelectronic materials
Full text «Opticheskii Zhurnal»
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Publication in Journal of Optical Technology
Кондратенко В.С., Мальцев П.П., Редькин С.В. Лазерная плазмохимическая обработка оптоэлектронных материалов // Оптический журнал. 2021. Т. 88. № 10. С. 78–82. http://doi.org/10.17586/1023-5086-2021-88-10-78-82
Kondratenko V.S., Maltsev P.P., Redkin S.V. Laser plasma–chemical treatment of optoelectronic materials [in Russian] // Opticheskii Zhurnal. 2021. V. 88. № 10. P. 78–82. http://doi.org/10.17586/1023-5086-2021-88-10-78-82
V. S. Kondratenko, P. P. Mal’tsev, and S. V. Red’kin, "Laser plasma–chemical treatment of optoelectronic materials," Journal of Optical Technology. 88(10), 606-609 (2021). https://doi.org/10.1364/JOT.88.000606
In this study, elements of a new technology for the treatment of optoelectronic materials—laser plasma–chemical treatment—are investigated considering the splitting of diamond and sapphire wafers into crystals as an example. Copper vapor lasers and an ultraviolet laser with wavelengths of 510.6, 578.2, and 355 nm, respectively, are used in the experiments. The working pressure in the reactor is 1×10−3−1×10−1torr.
laser, crystalls, wafer, plasma chemistry, etching
Acknowledgements:The research was supported by the Russian Foundation for Basic Research, grant No. 19-07-00683A.
OCIS codes: 350 3390
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