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УДК: 621.397
Analysis of fabrication tolerance based on uneven thickness of Su8-photo-resist
Полный текст на elibrary.ru
Публикация в Journal of Optical Technology
Qing Tao, Fengguang Luo, Jinxing Zhang, Bingcheng Mo, Rui Zhong, Dandan Miao, Xiaoxing Pan, Qianliang Liang Analysis of fabrication tolerance based on uneven thickness of Su8-photo-resist [на англ. яз.] // Оптический журнал. 2013. Т. 80. № 5. С. 94–97.
Qing Tao, Fengguang Luo, Jinxing Zhang, Bingcheng Mo, Rui Zhong, Dandan Miao, Xiaoxing Pan, Qianliang Liang Analysis of fabrication tolerance based on uneven thickness of Su8-photo-resist [in English] // Opticheskii Zhurnal. 2013. V. 80. № 5. P. 94–97.
Qing Tao, Fengguang Luo, Jinxing Zhang, Bingcheng Mo, Rui Zhong, Dandan Miao, Xiaoxing Pan, and Qianliang Liang, "Analysis of fabrication tolerance based on uneven thickness of Su8-photo-resist," Journal of Optical Technology. 80(5), 329-331 (2013). https://doi.org/10.1364/JOT.80.000329
In this paper, we have analyzed the relationship between light propagation performance and uneven thickness of Su8-photo-resist based on EOPCB. Although spinning process is used to even the Su8-photo-resist, the obtained Su8-photo-resist is uneven, which directly affect cross-section shape of core layer. As long as we control h ∈ 0; 3 μm and a, b ∈ 0; 2 μm, light propagation performance does not affected. But, it is easy to actually fabricate EOPCB.
spinning process, EOPCB, polymer optical waveguide
Благодарность:Работа выполнена при финансовой поддержке проекта Китайской национальной программы фундаментальных исследований и разработок (Программа 973) (грант № 2010CB328302).
Коды OCIS: 250.3680, 5460
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