Ellipsometric studies of the features of the formation of HfO2 films on optical glass

Одарич В.А. Эллипсометрические исследования особенностей формирования пленок HfO2 на оптическом стекле // Оптический журнал. 2009. Т. 76. № 5. С. 73–79.

Odarich V.A. Ellipsometric studies of the features of the formation of HfO2 films on optical glass [in Russian] // Opticheskii Zhurnal. 2009. V. 76. № 5. P. 73–79.

W. A. Odarych, "Ellipsometric studies of the features of the formation of HfO₂ films on optical glass," Journal of Optical Technology. 76 (5), 306-311 (2009). https://doi.org/10.1364/JOT.76.000306

Multiangle ellipsometric studies of hafnium dioxide films 30-300nm thick, deposited on optical glass by electron-beam evaporation, have been carried out in the 314-632-nm spectral region. It is found that the collection of ellipsometric data can be described in a model of a two-layer reflective system. The parameters of the system are found. The inner layer is homogeneous, its refractive index, within the limits of error of the computational procedure, is identical for all the test samples, and the thickness increases during the deposition of the film. The outer layer has a lower refractive index than the inner one, and its thickness varies within the limits 10-20nm for the different samples.