Study of low-threshold mechanisms for modifying the structure of thin chromium films under the action of supershort laser pulses

Вейко В.П., Ярчук М.В., Иванов А.И. Исследование низкопороговых механизмов модификации структуры тонких пленок хрома под действием сверхкоротких лазерных импульсов // Оптический журнал. 2011. Т. 78. № 8. С. 56–64.

Veiko V.P., Yarchuk M.V., Ivanov A.I. Study of low-threshold mechanisms for modifying the structure of thin chromium films under the action of supershort laser pulses [in Russian] // Opticheskii Zhurnal. 2011. V. 78. № 8. P. 56–64.

V. P. Veĭko, M. V. Yarchuk, and A. I. Ivanov, "Study of low-threshold mechanisms for modifying the structure of thin chromium films under the action of supershort laser pulses," Journal of Optical Technology. 78(8), 512-518 (2011). https://doi.org/10.1364/JOT.78.000512

This paper discusses a thermochemical method for recording information, based on local laser oxidation of thin chromium films, followed by etching of the unirradiated region. This method is an alternative to laser photolithography and direct laser removal of a chromium film. It is mainly used to fabricate diffraction optical elements. The thermochemical method of recording information lacks the thermal and hydrodynamic distortions of the pattern that characterize laser ablation, while the number of process operations is substantially less than in photolithography. Diffraction optical elements are currently used in large telescopes, microlens arrays, laser optics, etc. The main requirement on all types of diffraction optical elements is high spatial resolution. The search for methods of increasing the resolution of diffraction optical elements is the main motivation for studying the structure of irradiated chromium films.

The research was supported by RFBR grant No. 09-02-01065а and state contract No. П1134.