УДК: 538.958

Selective absorption in thermally oxidized nanoporous silicon

Mikhailov, A.V., Grigoriev, L.V., Konorov P.P.

Publication in Journal of Optical Technology

For Russian citation (Opticheskii Zhurnal):

Михайлов А.В., Григорьев Л.В., Коноров П.П. Селективное поглощение в термически окисленном нанопористом кремнии // Оптический журнал. 2012. Т. 79. № 2. С. 54–58.

Mikhaĭlov A. V., Grigor’ev L. V., Konorov P. P. Selective absorption in thermally oxidized nanoporous silicon // Opticheskii Zhurnal. 2012. V. 79. № 2. P. 54–58.

For citation (Journal of Optical Technology):

A. V. Mikhaĭlov, L. V. Grigor’ev, and P. P. Konorov, "Selective absorption in thermally oxidized nanoporous silicon," Journal of Optical Technology. 79(2), 99-101 (2012). https://doi.org/10.1364/JOT.79.000099

Abstract:

This paper presents a study of the optical properties of thermally oxidized nanoporous silicon in the wavenumber range 5000–400 cm−1. It is shown for the first time that thermally oxidized nanoporous silicon has two broad regions of reduced transmittance in the wavenumber range from 3720 to 3000 cm−1 and five narrow zones that have their minima at the following wave numbers: 2920, 2240, 1680, 840, and 600 cm−1. The transmittance spectra of the thermally oxidized SiO2–Si structure are measured in the wavenumber range 5000–400 cm−1. It is established that the thermally oxidized SiO2–Si structure is transparent in the wavenumber range 5000–1200 cm−1 and has narrow absorption peaks insignificant in magnitude at 1090 cm−1 and 620 cm−1. It is shown that thermally oxidized nanoporous silicon can be used as a selectively absorbing and recording medium in the IR range.

Keywords:

thermally oxidized nanoporous silicon, selective absorption, optoelectronic receiver сomponent

OCIS codes: 160.4330, 160.5470, 230.0250

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