Technological conditions for optimizing the characteristics of holographic diffraction gratings on arsenic selenide films

Вандюков Е.А., Знаменский М.Ю., Саттаров Ф.А. Технологические условия оптимизации характеристик голограммных дифракционных решеток на слоях селенида мышьяка // Оптический журнал. 2007. Т. 74. № 5. С. 58–62.

Vandyukov E.A., Znamenskiy M.Yu., Sattarov F.A. Technological conditions for optimizing the characteristics of holographic diffraction gratings on arsenic selenide films [in Russian] // Opticheskii Zhurnal. 2007. V. 74. № 5. P. 58–62.

E. A. Vandyukov, M. Yu. Znamenskiĭ, and F. A. Sattarov, "Technological conditions for optimizing the characteristics of holographic diffraction gratings on arsenic selenide films," Journal of Optical Technology. 74 (5), 347-350 (2007). https://doi.org/10.1364/JOT.74.000347

This paper discusses the optimum attainable technological conditions for obtaining holographic diffraction gratings, taking into account the study that has been carried out of the physical nature of photostimulated processes in vacuum-deposited arsenic selenide films and the choice of deposition rates and processing regimes of the exposed layers. A sequence that ensures that the optical characteristics of the gratings are maintained during the guaranteed operating lifetime is established for the operations at the concluding stage of the technological process.